Step-and-repeat nanoimprint lithography (NIL) is a promising technique to replicate nanoscale patterns at low cost across a large area. Last year, researchers Christophe Peroz and Scott Dhuey and ...
Leuven, Belgium-based independent nanoelectronics and nanotechnology research center IMEC reported today it has achieved significant progress with 193nm immersion lithography technology through the ...
Scanning probe lithography (SPL) represents a rapidly evolving class of nanofabrication techniques that utilise the precision of scanning probe microscopy to directly manipulate material surfaces at ...
Belgian research center IMEC today announced it has extended its lithography industrial affiliation program (IIAP) through 2003, using ASML’s PAS5500/1100 high NA 193nm step-and-scan system, ...
(Nanowerk Spotlight) Conventional optical lithography is the standard and most common technique in the semiconductor industry and in the microfabrication research field. Although several approaches ...
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