B. W. Smith, J. Zhou, "Snell or Fresnel – The influence of material index on hyper NA lithography" Proc. SPIE 6520, (2007) paper J. Zhou, N. Lafferty, B. W. Smith, J. H. Burnett, "Immersion ...
To make smaller transistors so chips can pack more gates and deliver higher performance, lithography must use shorter light wavelengths to form the smaller features. To that end, developments to ...
Professor Bruce Smith has been a member of the engineering faculty at RIT since joining the Microelectronic Engineering program in 1988. He is currently also the Director of the Microsystems ...
PORTLAND, Ore. — A German company is fielding modeling tools that can help chip makers assess the promise of immersion lithography. Putting a layer of water between a wafer and the stepper lens could ...
SANTA CLARA, CA - SEPTEMBER 18: A worker at the displays a strip of a hybrid silicon laser chip at company headquarters September 18, 2006 in Santa Clara, California. Intel announced today that its ...
San Francisco — Immersion scanners and other tools aimed at 45-nanometer lithography took a bow at Semicon West here last week. But despite the industry's optimism that particular tools are now ready ...
OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...
Lithography tools account for a significant portion of chipmakers' capital expenditures, with EUV platforms exceeding $150 million in price. ASML's immersion lithography tools allowed the company to ...
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