Fabrication of 3D NAND devices involves a challenging and complex deposition and etch process. Two etch processes have been identified as substantially impacting 3D NAND product yields: silicon ...
A chemical etching method for widening the pores of metal-organic frameworks (MOFs) could improve various applications of MOFs, including in fuel cells and as catalysts. Researchers at Nagoya ...
Transparent antennas are quickly moving from aesthetic novelty to engineering necessity. Learn how additive manufacturing is ...
What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...
A new approach combining atomic layer deposition and organic film etch process may solve critical challenges in the various processes in advanced nodes. We demonstrated a high selective and ...
As any good metallurgist will tell you, you can't just take any two types of metal and weld them together. You may instead be able to just join them together with glue, however, thanks to research ...
After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor etching method that achieves etch rates up to five times faster than ...
Ion beam expertise is critical to delivering the manufacturing tolerance required for these gratings. Oxford Instruments Plasma Technology has developed a technology to allow optical designers to ...
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